{"id":20282,"date":"2021-03-23T14:40:30","date_gmt":"2021-03-23T14:40:30","guid":{"rendered":"https:\/\/www.upjs.sk\/prirodovedecka-fakulta\/pracoviska\/ufv\/vv\/infr\/nanotechnologicke-laboratorium-na-pripravu-nanosuciastok\/"},"modified":"2022-11-13T21:31:07","modified_gmt":"2022-11-13T20:31:07","slug":"nanotechnologicke-laboratorium-na-pripravu-nanosuciastok","status":"publish","type":"cpt_pracoviska","link":"https:\/\/www.upjs.sk\/prirodovedecka-fakulta\/pracoviska\/ustavy-pf\/ufv\/vv\/infr\/nanotechnologicke-laboratorium-na-pripravu-nanosuciastok\/","title":{"rendered":"Nanotechnologick\u00e9 laborat\u00f3rium na pr\u00edpravu nanos\u00fa\u010diastok pre elektroniku, senzory a environment\u00e1lne aplik\u00e1cie"},"content":{"rendered":"<h4 class=\"bordova\"><strong>Osoba zodpovedn\u00e1 za laborat\u00f3rium, kontakt, financovanie<\/strong><\/h4>\n<p>Nanotechnologick\u00e9 laborat\u00f3rium na pr\u00edpravu nanos\u00fa\u010diastok pre elektroniku, senzory a environment\u00e1lne aplik\u00e1cie sa zaviedlo v r\u00e1mci projektov \u0160truktur\u00e1lnych fondov CEX EXTREM I, II Centra pokro\u010dil\u00fdch fyzik\u00e1lnych \u0161t\u00fadi\u00ed materi\u00e1lov v extr\u00e9mnych podmienkach, centra excelentnosti ASFEU (EU ERDF European regional development fund, Grant No. <strong>ITMS 26220120005<\/strong>). Na jeho vybudovanie boli zatia\u013e pou\u017eit\u00e9 finan\u010dn\u00e9 prostriedky v celkovej v\u00fd\u0161ke jeden mili\u00f3n Eur. Ved\u00facim nanolaborat\u00f3ria je Mgr. Vladim\u00edr Komanick\u00fd, PhD. (vladimir.komanicky@upjs.sk).<br \/> \u00a0<\/p>\n<h4 class=\"bordova\"><strong>Umiestnenie laborat\u00f3ria<\/strong><\/h4>\n<p>Laborat\u00f3rium je umiestnen\u00e9 v priestoroch Centra fyziky n\u00edzkych tepl\u00f4t Pr\u00edrodovedeckej fakulty UPJ\u0160 a \u00dastavu experiment\u00e1lnej fyziky SAV v Ko\u0161iciach \u2013 Centre excelentnosti (http:\/\/www.saske.sk\/CLTP), Park Angelinum 9.<br \/> \u00a0<\/p>\n<h4 class=\"bordova\"><strong>Experiment\u00e1lne vybavenie laborat\u00f3ria<\/strong><\/h4>\n<p>V laborat\u00f3riu s\u00fa umiestnen\u00e9 technol\u00f3gie na pr\u00edpravu nano\u0161trukt\u00far, ktor\u00e9 patria do skupiny tzv. top-dow metod\u00edk. Top-down technol\u00f3gie s\u00fa vyu\u017e\u00edvan\u00e9 hlavne v po\u010d\u00edta\u010dovom priemysle, napr\u00edklad pri pr\u00edprave mikroprocesorov a pam\u00e4t\u00ed. Tieto metodiky umo\u017e\u0148uj\u00fa z ve\u013ekej matrice pripravi\u0165 nano\u0161trukt\u00fary a nanos\u00fa\u010diastky s presne kontrolovanou ve\u013ekos\u0165ou, rozmiestnen\u00edm a tvarom. Tak\u00e9to technol\u00f3gie si vy\u017eaduj\u00fa priestory s \u010do najni\u017e\u0161ou pra\u0161nos\u0165ou. Laborat\u00f3rium je preto vybaven\u00e9 vysoko\u00fa\u010dinnou filtr\u00e1ciou vzduchu HEPA filtrami a materi\u00e1ly pou\u017eit\u00e9 pri jeho v\u00fdstavbe museli by\u0165 kompatibiln\u00e9 s n\u00e1rokmi kladen\u00fdmi na umiestnenie tak\u00fdchto technol\u00f3gi\u00ed. V s\u00fa\u010dasnosti je v laborat\u00f3riu k dispoz\u00edci\u00ed nieko\u013eko aparat\u00far na pr\u00edpravu a charakteriz\u00e1ciu tenk\u00fdch vrstiev a nano\u0161trukt\u00far. At\u00f3mov\u00e1 silov\u00e1 mikroskopia (AFM) vyu\u017e\u00edva na skenovanie po povrchu vzorky a ve\u013emi ostr\u00fd hrot vyroben\u00fd z tvrd\u00e9ho materi\u00e1lu. AFM umo\u017e\u0148uje charakteriz\u00e1ciu povrchov s plochou nieko\u013ek\u00fdch desiatok mikrometrov, s rozl\u00ed\u0161en\u00edm nieko\u013eko desiatok a\u017e jednotiek nanometrov. T\u00fdmto zariaden\u00edm sa d\u00e1 sk\u00fama\u0165 nielen topografia povrchov, ale aj ich magnetick\u00e9, elektrick\u00e9 a mechanick\u00e9 vlastnosti. \u010ealej tento pr\u00edstroj umo\u017e\u0148uje aj pr\u00edpravu nano\u0161trukt\u00far a nanomanipul\u00e1cie. Aparat\u00fara na pr\u00edpravu tenk\u00fdch vrstiev magnetr\u00f3nov\u00fdm napra\u0161ovan\u00edm, model Orion od firmy AJA International, umo\u017e\u0148uje pr\u00edpravu tenk\u00fdch vrstiev, kovov\u00fdch aj nekovov\u00fdch materi\u00e1lov od hr\u00fabky nieko\u013ek\u00fdch nanometrov a\u017e po nieko\u013eko mikrometrov. Napra\u0161ovacia aparat\u00fara je vybaven\u00e1 piatimi magnetr\u00f3nov\u00fdmi delami v tzv. konfok\u00e1lnej konfigur\u00e1cii, pomocou ktor\u00fdch je mo\u017en\u00e9 pripravi\u0165 filmy z vysokou uniformitou hr\u00fabky a\u017e z troch materi\u00e1lov naraz, \u010do sa d\u00e1 \u010falej vyu\u017ei\u0165 aj v materi\u00e1lovom v\u00fdskume najm\u00e4 pri pr\u00edprave pokrokov\u00fdch multikompozitn\u00fdch materi\u00e1lov a sendvi\u010dov\u00fdch multivrstiev s presne definovan\u00fdm zlo\u017een\u00edm a hr\u00fabkou.<br \/> Laborat\u00f3riumje \u010falej vybaven\u00e9 s pr\u00edstrojmi, ktor\u00e9 umo\u017e\u0148uj\u00fa pr\u00edpravu nano\u0161trukt\u00far pomocou litografi\u00ed vo vrstv\u00e1ch rezistov ktor\u00e9 sa potom prenes\u00fa na substr\u00e1t pomocou leptania, alebo selekt\u00edvnym nanesen\u00edm \u010fals\u0161ieho material. Laborat\u00f3rium disponuje leptac\u00edm zariaden\u00edm pomocou reakt\u00edvnej i\u00f3novej plazmy. Takisto je vlaborat\u00f3riu mo\u017en\u00e9 spracov\u00e1va\u0165 men\u0161ie vzorky a substr\u00e1ty \u017e\u00edhan\u00edm v trubkovj peci do 1000 \u00b0C v kontrolovanej atmosf\u00e9re a nan\u00e1\u0161a\u0165 a spracov\u00e1va\u0165 rezity. Laborat\u00f3rium je vybaven\u00e9 aj syst\u00e9mom na pr\u00edpravu ultra\u010distej deionizovanej vody. Laborat\u00f3rium poskytuje komplexn\u00fa inhouse infra\u0161trukt\u00faru na pr\u00edpravu a charakteriz\u00e1ciu tenk\u00fdch vrstiev, nano\u010dast\u00edc, nano\u0161trukt\u00far a nanos\u00fa\u010diastok pre elektroniku, sensory a enviroment\u00e1lne aplik\u00e1cie so zameran\u00edm pre aplikovan\u00fa katal\u00fdzu pre vod\u00edkov\u00e9 palivov\u00e9 \u010dl\u00e1nky.<br \/> \u00a0<\/p>\n<h4 class=\"bordova\"><strong>V\u00fdskumn\u00e9 mo\u017enosti a ponuka meran\u00ed odbornej verejnosti<\/strong><\/h4>\n<ol>\n<li>Pr\u00edprava a charakteriz\u00e1cia tenk\u00fdch vrstiev a povlakov. Nan\u00e1\u0161anie tenk\u00fdch vrstiev na materi\u00e1ly s presne definovanou hr\u00fabkou.Pr\u00edprava kovov\u00fdch a nekovov\u00fdch tenk\u00fdchch vrstiev od sub nm po nieko\u013eko sto nm vo vysokom v\u00e1kuu (~10-9 Torr) od 25 \u00b0C &#8211; 800 \u00b0C. Napra\u0161ovacia aparat\u00fara ORION.\n<ul type=\"disc\">\n<li>5 magnetr\u00f3nov, 2 DC a 1 RF zdroj<\/li>\n<li>V s\u00fa\u010dastnosti je mo\u017enos\u0165 nanies\u0165 tieto materi\u00e1ly Nb, Cu, Au, Ni, Ti, Co, Fe, Pt, permalloy, SiO2, SiN<\/li>\n<li>Je mo\u017en\u00e9 nanies\u0165 automatizovan\u00fdm sp\u00f4sobom tenk\u00e9 multivrstvy a zmie\u0161an\u00e9 vrstvy tzv. kodepoz\u00edciou<\/li>\n<li>Mo\u017enos\u0165 depoz\u00edcie v reaktivnych atmosf\u00e9rach. (O2 a N2)<\/li>\n<li>Mo\u017enost ovplyvni\u0165 stres v tenkej vrstve tzv. rf biasom na vzorke<\/li>\n<\/ul>\n<\/li>\n<li>Pr\u00edprava nanos\u00fa\u010diastok a nano\u0161trukt\u00far pomocou litografick\u00fdch procesov a ich charakteriz\u00e1cia pomocou mikroskopick\u00fdch a spektroskopic\u00fdch metod\u00edk.\n<p> \tMask aligner SUSS MJB4, pr\u00edprava mezoskopick\u00fdch \u0161trukt\u00far do 1 mikrometra \t<\/p>\n<ul type=\"disc\">\n<li>Kontakt, proximity a hard kontakt<\/li>\n<li>Technol\u00f3gia vyu\u017eiva 4\u201c masky<\/li>\n<\/ul>\n<p> \tTermoemistn\u00fd REM od fy TESCAN model VEGA<\/p>\n<p> \tRastrovac\u00ed elektronov\u00fd mikroskop s termoemisnou kat\u00f3dou s mo\u017enos\u0165ou pr\u00e1ce v re\u017eime n\u00edzk\u00e9ho v\u00e1kua vhodn\u00fd na mikroskopick\u00fa charakteriz\u00e1ciu aj slabo vodiv\u00fdch vzoriek bez pokovenia. EDS analyz\u00e1tor umo\u017e\u0148uje kvantitat\u00edvnu a kvalitat\u00edvnu prvkov\u00fa anal\u00fdzu a mapovanie rozlo\u017eenia prvkov vo vzorke od b\u00f3ru vy\u0161\u0161ie. Mikroskop je vybaven\u00fd aj elektr\u00f3novou litografiou. Elektr\u00f3nov\u00e1 mikroskopia. \t<\/p>\n<ul type=\"disc\">\n<li>Elektronov\u00fd mikroskop.<\/li>\n<li>Nede\u0161trukt\u00edvna prvkov\u00e1 anal\u00fdza vzoriek pomocou EDS.<\/li>\n<li>Pr\u00edprava nanos\u00fa\u010diastok a nano\u0161trukt\u00far pomocou elektr\u00f3novej litografie a ich charakteriz\u00e1cia pomocou mikroskopick\u00fdch a spektroskopic\u00fdch metod\u00edk.<\/li>\n<\/ul>\n<p> \tTermoemistn\u00fd REM od fy TESCAN model VEGA \t<\/p>\n<ul type=\"disc\">\n<li>Charakteriz\u00e1cia vzoriek pomocou REM, aj slabo<\/li>\n<li>vodiv\u00fdch bez pokovenia<\/li>\n<li>EDAX<\/li>\n<li>Elektr\u00f3nov\u00e1 litografia<\/li>\n<\/ul>\n<\/li>\n<li>Spracovanie vzoriek \u017e\u00edhan\u00edm a leptan\u00edm.\n<ul type=\"disc\">\n<li>Nan\u00e1\u0161anie rezistov spincoaterom,<\/li>\n<li>Vyvol\u00e1vanie rezistov a lift-off,<\/li>\n<li>Mokr\u00e9 leptanie<\/li>\n<li>\u017d\u00edhanie substr\u00e1tov a vzoriek a\u017e do 1000 \u00b0C v N2, O2 a Ar.<\/li>\n<li>Such\u00e9 leptanie pomocou RIE, (CF4 a O2)<\/li>\n<\/ul>\n<\/li>\n<li>Elektrolytick\u00e9 pokovovanie, stanovenie aktivity a stability heterog\u00e9nnych katalyz\u00e1torov.<\/li>\n<\/ol>\n<p>\u00a0<\/p>\n<h4 class=\"bordova\"><strong>Fotogal\u00e9ria<\/strong><\/h4>\n","protected":false},"author":1,"featured_media":15067,"parent":20272,"menu_order":9,"template":"","meta":{"_editorskit_title_hidden":false,"_editorskit_reading_time":0,"_editorskit_is_block_options_detached":false,"_editorskit_block_options_position":"{}"},"categories":[],"tags":[],"tax_aktuality":[],"class_list":["post-20282","cpt_pracoviska","type-cpt_pracoviska","status-publish","has-post-thumbnail","hentry"],"acf":{"acf_link_na_externy_obsah":""},"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v23.8 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>Nanotechnologick\u00e9 laborat\u00f3rium na pr\u00edpravu nanos\u00fa\u010diastok pre elektroniku, senzory a environment\u00e1lne aplik\u00e1cie - Pr\u00edrodovedeck\u00e1 fakulta | UPJ\u0160<\/title>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.upjs.sk\/prirodovedecka-fakulta\/pracoviska\/ustavy-pf\/ufv\/vv\/infr\/nanotechnologicke-laboratorium-na-pripravu-nanosuciastok\/\" \/>\n<meta property=\"og:locale\" content=\"sk_SK\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Nanotechnologick\u00e9 laborat\u00f3rium na pr\u00edpravu nanos\u00fa\u010diastok pre elektroniku, senzory a environment\u00e1lne aplik\u00e1cie - Pr\u00edrodovedeck\u00e1 fakulta | UPJ\u0160\" \/>\n<meta property=\"og:description\" content=\"Osoba zodpovedn\u00e1 za laborat\u00f3rium, kontakt, financovanie Nanotechnologick\u00e9 laborat\u00f3rium na pr\u00edpravu nanos\u00fa\u010diastok pre elektroniku, senzory a environment\u00e1lne aplik\u00e1cie sa zaviedlo v r\u00e1mci projektov \u0160truktur\u00e1lnych fondov CEX EXTREM I, II Centra pokro\u010dil\u00fdch fyzik\u00e1lnych \u0161t\u00fadi\u00ed materi\u00e1lov v extr\u00e9mnych podmienkach, centra excelentnosti ASFEU (EU ERDF European regional development fund, Grant No. ITMS 26220120005). 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